Laser-modified graphene enables molecule-thick films to grow only where needed

Researchers from the University of Jyväskylä and Aalto University have developed a new method based on laser modification, ...
Nature

Atomic Layer Etching And Deposition Techniques

Atomic layer etching (ALE) and atomic layer deposition (ALD) represent pivotal techniques in nanofabrication, enabling control of material removal and growth at the atomic scale. By utilising ...
Aalto University

Postdoctoral Researcher in Atomic Layer Deposition (ALD)

Robin Ras at Aalto University invites applications for a postdoctoral position in thin film deposition for an advanced medical technology that we are planning to commercialize in near future. We are ...
AZoNano

What is Atomic Layer Deposition?

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...
Nature

Atomic Layer Deposition and Thin Film Technologies

Atomic Layer Deposition (ALD) and thin film technologies have become indispensable in modern materials science thanks to their ability to achieve angstrom‐level control over film thickness and ...
AZOM

Accelerating New Material Development with Particle Atomic Layer Deposition Process

A pathway for ALD-enhanced materials to be quickly developed and transitioned from lab-scale to commercial production is available for almost any application, for the first time ever. Atomic-level ...
gasworld

Air Liquide opens advanced chip materials plant in Taiwan

Industrial gas major Air Liquide has opened its first large-scale production plant for advanced deposition and etching ...
Physics World

What atomic-layer deposition could do for energy and the environment

Anna Demming discovers why the vacuum-based technique of atomic-layer deposition – a variant of chemical-vapour deposition – holds so much promise for energy and environmental applications Greener ...
Nanowerk

Researchers invent a new atomic layer deposition process

(Nanowerk News) A new way to deposit thin layers of atoms as a coating onto a substrate material at near room temperatures has been invented at The University of Alabama in Huntsville (UAH), a part of ...
AZoNano

Breaking Barriers in Thin-Film Deposition with ATLANT 3D’s DALP Technology

In this interview, discover how ATLANT 3D's DALP technology is revolutionizing thin-film deposition, enabling rapid prototyping and advanced material applications in nanofabrication. Can you please ...
Nanowerk

ALD (Atomic Layer Deposition)

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...